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Pricise Cleaning
Pricise Cleaning
In order to meet the increasing requirements of semiconductor manufacturing process, relying on the first-class technical support from the United States and Japan, the company has successfully completed the R&D of ceramic injection technology and mass production, and owns the international advanced cleaning production line, striving to seize the commanding heights of semiconductor and TFT industry technology.
Technological Development Route Technical Equipment Capability Cleaning process National patent for utility model
  • In 2000

    Founded Surface Treatment Division


  • In 2001

    Successfully developed and mass-produced 350nm line-width semiconductor PVD, CVD parts cleaning process and began to 

    develop semiconductor ETC parts cleaning process

  • In 2003

    Successfully developed and mass-produced 250nm line-width semiconductor PVD, CVD, ETC parts cleaning process. Established 

    an independent laboratory to develop more advanced cleaning process for semiconductors. Started research and development of 

    DIF and LIT parts cleaning process

  • In 2005

    Started cleaning of TFT parts, successfully developed and standardized the cleaning process of the machine parts of 

    semiconductor departments

  • In 2007

    Provided parts cleaning services for a number of semiconductor and TFT factories, and improved the cleaning process of TFT parts

  • In 2011

    Established the first subsidiary----- Ferrotec (Tianjin) Technology Co., Ltd

  • In 2013

    Successfully mass-produced cleaning technology of 45nm line width semiconductor process parts and 8.5 generation line TFT parts

  • In 2015

    Established the second subsidiary---- Ferrotec (Sichuan) Technology Co., Ltd., successfully developed and mass-produced 28nm 

    line width semiconductor process parts cleaning technology

  • In 2017

    The third subsidiary---- Ferrotec (Dalian) Technology Co., Ltd. formally put into production, research and development and

     mass production of 10.5 generation LCD parts cleaning process; improved ceramic spray process and put into mass production, 

    started research and development the 6th generation OLED parts cleaning process, began to develop semiconductor 16nm 

    parts cleaning process

  • In 2018

    The prototype of the surface treatment analysis laboratory of Dalian Plant was established, and the high-tech equipment such 

    as ultrasonic tomography microscope, CMM, He detector, potentiometric titrator, LPC and ICP MS were put into operation.And 

    established high-purity quartz line

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